🐬
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Point defects and dopant diffusion in silicon
P. Fahey,
P. Griffin,
J. Plummer
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10 |
1989 |
10 🐬
|
🐬
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I-MOS: a novel semiconductor device with a subthreshold slope lower than kT/q
K. Gopalakrishnan,
P. Griffin,
J. Plummer
|
8 |
2002 |
8 🐬
|
🐬
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Impact ionization MOS (I-MOS)-Part I: device and circuit simulations
K. Gopalakrishnan,
P. Griffin,
J. Plummer
|
8 |
2005 |
8 🐬
|
🐬
|
Activation and diffusion studies of ion-implanted p and n dopants in germanium
C. O. Chui,
K. Gopalakrishnan,
P. Griffin,
J. Plummer,
K. Saraswat
|
8 |
2003 |
8 🐬
|
🐬
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Bipolar resistive switching in polycrystalline TiO2 films
K. Tsunoda,
Y. Fukuzumi,
J. Jameson,
Zheng Wang,
P. Griffin,
Y. Nishi
|
7 |
2007 |
7 🐬
|
🐢
|
Material and process limits in silicon VLSI technology
J. Plummer,
P. Griffin
|
7 |
2001 |
7 🐢
|
🐬
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Fractional contributions of microscopic diffusion mechanisms for common dopants and self-diffusion in silicon
A. Ural,
P. Griffin,
J. Plummer
|
7 |
1999 |
7 🐬
|
🐬
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Impact ionization MOS (I-MOS)-Part II: experimental results
K. Gopalakrishnan,
R. Woo,
C. Jungemann,
P. Griffin,
J. Plummer
|
7 |
2005 |
7 🐬
|
🐬
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Physical processes associated with the deactivation of dopants in laser annealed silicon
Y. Takamura,
P. Griffin,
J. Plummer
|
7 |
2002 |
7 🐬
|
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SELF-DIFFUSION IN SILICON : SIMILARITY BETWEEN THE PROPERTIES OF NATIVE POINT DEFECTS
A. Ural,
P. Griffin,
J. Plummer
|
6 |
1999 |
6 🐬
|
🐬
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A High-Resolution Low-Power Incremental $\Sigma\Delta$ ADC With Extended Range for Biosensor Arrays
A. Agah,
K. Vleugels,
P. Griffin,
M. Ronaghi,
J. Plummer,
B. Wooley
|
6 |
2010 |
6 🐬
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